Top University Officials Tour NCSU Nanofabrication Facility

August 20, 2008

NNF Official explains facility operations to the Provost 
NNF Official explains facility operations to the Provost

On August 7th a group of several NC State University officials toured the NCSU Nanofabrication Facility.

Included in the group were Provost Larry Nielsen, Interim Vice-Chancellor for Research Terri Lomax, COE Dean Louis Martin-Vega and Associate Dean for Research John Strenkowski.  Before the tour, the team met with the NNF Director, M.C. Ozturk, lab manager Marcio Cerullo, ECE Interim Department Head Robert Kolbas and the members of the NNF advisory committee including Veena Misra, Mark Johnson, and Steven Shannon.  The group discussed NNF's vision, opportunities and challenges.

"We were very pleased to host Provost Nielsen, Vice-Chancellor Lomax, Dean Martin-Vega and Associate Dean Strenkowski in the NCSU Nanofabrication facility.  Their visit was indeed a historic event, which showed the University administration's commitment to advancing the nanotechnology research at NCSU," said Ozturk.

Provost Larry Nielsen touring the Nanofabrication Facility 
Provost Larry Nielsen touring the Nanofabrication Facility

The NCSU Nanofabrication Facility provides users with a broad range of nanofabrication capabilities to support a diverse set of projects.  The facility houses virtually all standard thin film processing tools including a state-of-the-art ASML laser  scanner for high volume, 193nm patterning.  The facility serves as a melting pot for a community of top-notch researchers from academica, government labs and industry representing a variety of disciplines. It is located in the Larry K. Monteith Engineering Research Center on Centennial Campus and occupies a 7400 square feet class 100 and class 1000 cleanroom.

The facility has a full range of micro and nano-fabrication capabilities including: photolithography, reactive ion etching (RIE), deep RIE, low pressure chemical vapour deposition (LPCVD), plasma enhanced CVD, rapid thermal anneal, thermal oxidation, solid source diffusion, thermal and e-beam evaporation, sputtering, chemical mechanical polishing, various wet etching and cleaning processes, along with various characterization tools.