A Paper by Di. Spigna Wins Best Paper Award at VLSI-SoC 2012

October 26, 2012

Transmission Electron Micrograph (TEM) of the cross section of the device 
Transmission Electron Micrograph (TEM) of the cross section of the device

A paper titled "A Novel Double Floating-Gate Unified Memory Device", authored by Dr. Neil Di Spigna, Research Assistant Professor of Electrical and Computer Engineering, has won the Best Paper Award at the  IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC) 2012. This years conference was held October 8-11 in Santa Cruz, CA.

VLSI-SoC 2012 is the 20th in a series of international conferences sponsored by IFIP TC 10 Working Group 10.5, IEEE CEDA and CASS that explores the state-of-the-art and the new developments in the field of Very Large Scale Integration (VLSI), System-on-Chip (SoC) and their designs. Previous Conferences have taken place in Edinburgh, Trondheim, Tokyo, Vancouver, Munich, Grenoble, Gramado, Lisbon, Montpellier, Darmstadt, Perth, Nice, Atlanta, Rhodes, Florianopolis and Madrid.

The purpose of VLSI-SoC is to provide a forum to exchange ideas, and show industrial and research results in the fields of VLSI/ULSI Systems, SoC design, VLSI CAD and Microelectronic Design and Test.

Die level photo of the test devices 
Die level photo of the test devices

The presentation of the award came during the banquet at the close of the conference.

Co-authors of this paper were Drs. Daniel Schinke and Srikant Jayanti of Intel Corp. and Drs. Veena Misra and Paul Franzon, Professors of Electrical and Computer Engineering at NC State.

Neil Di Spigna is a research assistant professor in the ECE department at NCSU and the CTO of Polymer Braille Inc. His research interests include nanoelectronic devices and assistive technologies. Di Spigna received a PhD in electrical engineering from NCSU.

Daniel Schinke received a PhD in electrical engineering from NCSU. His research interests include digital circuit design and nonvolatile memory devices. He currently works for Intel Corp.

Srikant Jayanti received a PhD in electrical engineering from NCSU. His research interests include fabrication and characterization of high-k dielectrics/metal gate electrodes for advanced logic/memory devices. He currently is a process engineer for Intel Corp.